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DOT Code: 972.382-022

Industry: electron. comp.

Generates computer tape or disk of processing instructions for use in electron-beam fabrication of photo masks used in integrated circuit (Ic) manufacture, using computer graphics system and software and applying knowledge of photo mask layout: Reviews work order and specification manuals to determine data required to lay out array (arrangement of integrated circuit layer patterns) for reproduction onto photo mask. Enters commands into computer, using keyboard, to retrieve from data file and display on display screen existing array format information. Calculates additional array information required, such as array center and coordinates, number of rows and columns in array, and location of test patterns in array, following specification manual and work order instructions. Locates file (computer tape) relating to specified Ic layer and loads tape into computer tape drive. Enters specified commands into computer, using keyboard to retrieve Ic layer pattern from file and display pattern on array format on computer display screen. Positions Ic layer patterns and test patterns within array format on display screen, using knowledge of photo mask layout and computer graphics. Enters electron-beam exposure instructions into computer and keys in commands to transfer array data and exposure instructions onto computer disk or tape for use by Photo Mask Maker, Electron-Beam (electron. comp.) 972.382-018. May enter commands into computer, using keyboard, to transfer Ic layer patterns onto hard copy (plots), using plotter peripheral equipment. May inspect plots of Ic layer patterns for layout errors.

GOE: 05.10.05 STRENGTH: L GED: R3 M3 L3 SVP: 6 DLU: 86