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DOT Code: 590.684-026

Industry: electron. comp.

Immerses semiconductor wafers in series of chemical baths to etch circuitry patterns into or to strip excess photoresist from wafer surfaces: Places semiconductor wafers in containers, such as boats or cassettes, using vacuum wand or tweezers. Immerses loaded containers in series of chemical and water baths to etch circuitry patterns into or strip excess photoresist from wafer surfaces. Places loaded container into air or spin dryer and pushes buttons to activate drying cycle. May visually inspect etched and stripped wafer, using microscope, to detect scratches, contaminants, and to verify conformance to specifications. May tend plasma (gas) etch machine to etch circuitry patterns into wafer surfaces. May clean and maintain chemical baths.

GOE: 06.04.19 STRENGTH: M GED: R2 M1 L2 SVP: 2 DLU: 88